Semiconductor Measurements and Instrumentation


Semiconductor Measurements and Instrumentation

Bücher Details

  • Titel:Semiconductor Measurements and Instrumentation
  • Dateiname: semiconductor-measurements-and-instrumentation.pdf
  • ISBN: 26249570576971
  • Datum des Hochladens: 2020-01-15
  • Anzahl der Seiten: 604 Seiten
  • Autor: W. R. Runyan/T. J. Shaffner
  • Verlag: W. R. Runyan/T. J. Shaffner

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Synopsis This is the definitive reference on semiconductor characterization tools! Here in one well-organized volume are detailed explanations of the advanced and 'traditional' techniques for evaluating virtually every criterion: crystal defects impurity concentration lifetime film thickness resistivity and such critical electrical properties as mobility Hall effect and conductivity type. Reliable high-accuracy methods of measuring hardness stress and various kinds of surface contamination are also included.In addition to its value as a practical everyday reference the text also serves as an excellent user's guide to the latest methods of optical microscopy scanning electron microscopy (SEM) electron microprobe analysis transmission electron microscopy (TEM) Auger electron spectroscopy (AES) scanning probe microscopy (SPM) and secondary ion mass spectrometry (SIMS). This is the only guide that offers such 'dual coverage' of its topic - in terms of both measurements and tools. Buchrückseite The definitive reference on semiconductor characterization tools! Semiconductor Measurements & Instrumentation Second Edition. This fully updated edition of the classic reference incorporates all the new approaches and tools for semiconductor material characterization that have been developed to accomodate ever-shrinking semiconductor geometries. Here in one well-organized volume are detialed explanations of the advanced techniques for evaluating virtually every criterion: crystal defects impurity concentration lifetime film thickness resistivity and such critical electrical properties as mobility Hall effect and conductivity type. Reliable high-accuracy methods of measuring hardness stress and various kinds of surface contamination are also included. In addition to its value as a practical everyday reference the text also serves as an excellent user's guide to the latest methods of optical microscopy scanning electron microscopy (SEM) electron microprobe analysis transmission electron microscopy (TEM) Auger electron spectroscopy (AES) scanning probe microscopy (SPM) and secondary ion mass spectrometry (SIMS). As the only guide that offers such 'dual coverage' of its topic--in terms of both measurements and tools--and this timely and thorough reference is sure to be of considerable ongoing benefit to solid state and semiconductor engineers. Alle Produktbeschreibungen

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